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Examination of Very Thin Free-standing Films with Slow Electrons

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F10%3A00352509" target="_blank" >RIV/68081731:_____/10:00352509 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Examination of Very Thin Free-standing Films with Slow Electrons

  • Original language description

    Free-standing films of thicknesses in units of nm have been examined using both reflected and transmitted electrons in the scanning low energy electron microscope.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology

  • ISBN

    978-4-9903248-2-7

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

  • Publisher name

    University of Toyama

  • Place of publication

    Toyama

  • Event location

    Toyama

  • Event date

    Sep 12, 2010

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article