Examination of Very Thin Free-standing Films with Slow Electrons
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F10%3A00352509" target="_blank" >RIV/68081731:_____/10:00352509 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Examination of Very Thin Free-standing Films with Slow Electrons
Original language description
Free-standing films of thicknesses in units of nm have been examined using both reflected and transmitted electrons in the scanning low energy electron microscope.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology
ISBN
978-4-9903248-2-7
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
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Publisher name
University of Toyama
Place of publication
Toyama
Event location
Toyama
Event date
Sep 12, 2010
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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