Observation of high stressed hydrogenated carbon nitride films by SLEEM

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F12%3A00386392" target="_blank" >RIV/68081731:_____/12:00386392 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Observation of high stressed hydrogenated carbon nitride films by SLEEM
Original language description
Two main factors can lead to losing adhesion in thin sputtered carbon nitride films: high residual stress and absorption of humidity. Basically, two different types of stress can be identified in thin films: compressive stress and tensile stress. Compressive stress can lead to wrinkling and film delamination, and tensile stress can cause the fracturing of thin films. For reactive sputtering of hydrogenated carbon nitride films, the compressive stress is typical. The films were prepared from graphite target (high purity, 99.9999 %) in mixture of nitrogen and hydrogen discharge.
Czech name
—
Czech description
—

Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
ISBN
978-80-87441-07-7
ISSN
—
e-ISSN
—
Number of pages
2
Pages from-to
43-44
Publisher name
Institute of Scientific Instruments AS CR, v.v.i
Place of publication
Brno
Event location
Skalský dvůr
Event date
Jun 25, 2012
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
—

Similar results(10)