Effect of native oxide on the crystal orientation contrast in SEM micrographs obtained at hundreds, tens and units of eV

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F21%3A00549396" target="_blank" >RIV/68081731:_____/21:00549396 - isvavai.cz</a>

Result on the web

<a href="https://www.sciencedirect.com/science/article/pii/S0304399120302928?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0304399120302928?via%3Dihub</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ultramic.2020.113144" target="_blank" >10.1016/j.ultramic.2020.113144</a>

Result language

angličtina

Original language name

Effect of native oxide on the crystal orientation contrast in SEM micrographs obtained at hundreds, tens and units of eV

Original language description

This paper aims to elucidate the effect of native air-formed oxide on the crystallographic contrast between differently oriented copper grains in scanning electron microscope images obtained at energies from 0 eV up to 1 keV. The contrast between the Cu grains is strongly affected by the presence of native oxide. The crystallographic orientation contrast between the grains without covering the native oxide layer is relatively weak at hundreds of eV, negligible at tens of eV, and dramatically increases at energies below 10 eV. At extremely low landing energies, say below similar to 1 eV, the surface potential differences caused by work function variations between the differently oriented Cu grains affect the primary electrons, which enables us to obtain the micrographs with high crystallographic contrast. This contrast becomes surprisingly visible even if the grains are covered by a several nm thick native oxide layer. The presence of the native air-formed oxide layer on the Cu surface is inconsiderable for the contrast formation at energies close to the mirror conditions (< 1 eV). The surface potential differences originating in the substrate can affect the incident electrons through the native oxide film situated on the Cu surface. Scanning low-energy electron microscopy is a powerful tool for mapping local work function differences with a spatial resolution slightly better than 30 nm due to high sensitivity to local electrical potentials.

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

<a href="/en/project/TN01000008" target="_blank" >TN01000008: Center of electron and photonic optics</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2021

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Ultramicroscopy

ISSN

0304-3991

e-ISSN

1879-2723

Volume of the periodical

220

Issue of the periodical within the volume

January

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

6

Pages from-to

113144

UT code for WoS article

000600833500006

EID of the result in the Scopus database

2-s2.0-85093933635