Silicon-based-light-emitting materials: implanted SiO 2 films and wide bandgap a-Si:H.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F01%3A02010489" target="_blank" >RIV/68378271:_____/01:02010489 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Silicon-based-light-emitting materials: implanted SiO 2 films and wide bandgap a-Si:H.
Original language description
The paper reviews critically the results of investigation of hydrogenated amorphous silicon (a-Si:H) and Si + - implanted SiO 2 films from the point of view of light emission applications. Wide band gap a-Si:H with the energy gap ranging from 2.0 to 2.2eV exhibits room temperature photoluminescence in the visible region.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Optical Organic and Inorganic Materials.
ISBN
0-8194-4120-1
ISSN
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e-ISSN
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Number of pages
11
Pages from-to
66-76
Publisher name
SPIE
Place of publication
Washington
Event location
Vilnius [LT]
Event date
Aug 16, 2000
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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