A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F09%3A00333649" target="_blank" >RIV/68378271:_____/09:00333649 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet
Original language description
Flux of positive ions to the substrate in the hollow cathode plasma jet system during deposition of titanium thin films was studied. The substrate was negatively biased by applying 50 kHz pulsed DC, or 0.50-1.25 MHz and 13.56 MHz high-frequency voltage to it. The ion flux determined in the DC hollow cathode discharge during the active high frequency bias was systematically higher than for the pulsed DC bias or determined right after the high frequency bias was turned off. On the other hand in the RF hollow cathode discharge, the ion fluxes determined for the active high frequency and 50 kHz low frequency bias were comparable. Possible explanations of this phenomenon are discussed.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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