Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F09%3A00335019" target="_blank" >RIV/68378271:_____/09:00335019 - isvavai.cz</a>

Alternative codes found

RIV/68407700:21340/09:00164553

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

Original language description

The pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a floating?? substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycleand high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Volume of the periodical

6

Issue of the periodical within the volume

S1

Country of publishing house

DE - GERMANY

Number of pages

6

Pages from-to

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UT code for WoS article

000272302900050

EID of the result in the Scopus database

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