Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00423298" target="_blank" >RIV/68378271:_____/13:00423298 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2013.09.031" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2013.09.031</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2013.09.031" target="_blank" >10.1016/j.tsf.2013.09.031</a>
Alternative languages
Result language
angličtina
Original language name
Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
Original language description
Semiconducting hematite Fe2O3 thin films were fabricated by means of reactive sputtering in a high power DC pulsed magnetron (HIPIMS) and in a DC pulsed hollow cathode plasma jet sputtering system. Fused silica slides (quartz) were used as substrates.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
549
Issue of the periodical within the volume
Dec
Country of publishing house
CH - SWITZERLAND
Number of pages
8
Pages from-to
184-191
UT code for WoS article
000327537100034
EID of the result in the Scopus database
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