High temperature PIN diodes based on amorphous hydrogenated silicon carbide and boron-doped diamond thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00522073" target="_blank" >RIV/68378271:_____/19:00522073 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
High temperature PIN diodes based on amorphous hydrogenated silicon carbide and boron-doped diamond thin films
Original language description
The novel a-SiC:H diode structures on transparent conductive boron-doped diamond (BDD), have been deposited by the PECVD. The future of in-situ integration of nanoparticles and quantum dots in thin film structures for optoelectronic applications requires deposition temperatures above 400C. On the boron-doped diamond were deposited thin film PIN structure on the base of a-SiC:H. The layers have been studied by the SEM, temperature resolved electrical conductivity, optical absorptance, photocurrent and PL spectroscopy. The BDD/a-SiC:H diodes have been characterized by I-V measurement and by EL spectroscopyn
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů