Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F20%3A00534023" target="_blank" >RIV/68378271:_____/20:00534023 - isvavai.cz</a>

Alternative codes found

RIV/49777513:23520/20:43959303

Result on the web

<a href="https://doi.org/10.1088/1361-6595/aba773" target="_blank" >https://doi.org/10.1088/1361-6595/aba773</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/aba773" target="_blank" >10.1088/1361-6595/aba773</a>

Result language

angličtina

Original language name

Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution

Original language description

We have determined the local plasma parameters using the Langmuir probe measurements with a sub-microsecond time resolution during positive voltage pulses of a bipolar high-power impulse magnetron sputtering discharge using an unbalanced magnetron with a titanium target. The effects of the positive voltage pulse amplitude and the delay between the negative voltage pulse end and the positive voltage pulse initiation are investigated as well as the spatial dependence of the plasma parameters at three distances from the target. From the results, the values of the average energy flux of ions during the positive voltage pulse to the substrate are estimated. We have found that the time evolution of the plasma parameters has similar developments which are independent of the positive voltage pulse parameters and the distance from the target, although the values of the plasma parameters are different.

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

<a href="/en/project/FV30177" target="_blank" >FV30177: Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2020

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science & Technology

ISSN

0963-0252

e-ISSN

—

Volume of the periodical

29

Issue of the periodical within the volume

8

Country of publishing house

GB - UNITED KINGDOM

Number of pages

11

Pages from-to

1-11

UT code for WoS article

000568418000001

EID of the result in the Scopus database

2-s2.0-85092265900