In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00546089" target="_blank" >RIV/68378271:_____/21:00546089 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22340/21:43923006
Result on the web
<a href="https://doi.org/10.1063/5.0057317" target="_blank" >https://doi.org/10.1063/5.0057317</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/5.0057317" target="_blank" >10.1063/5.0057317</a>
Alternative languages
Result language
angličtina
Original language name
In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films
Original language description
Ultra-thin silver films of thicknesses of the order of 10 nm and less were prepared in different ambient conditions (vacuum, Ar, and N2) by pulsed laser deposition on glass and fused silica substrates. The in situ monitoring of electrical resistance of deposited films and optical emission spectroscopy of plasma were implemented as real-time analysis techniques. Change in the growth mechanism of the Ag layer in N2 ambient is expressed by an acceleration of the coalescence process, which shifts the percolation point toward lower mass thicknesses.The films prepared in vacuum and Ar ambient were found to be unstable for a final resistance in the range from 1 to 100MΩ while the films deposited in N2 revealed stable electrical resistance.n
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
1089-7550
Volume of the periodical
130
Issue of the periodical within the volume
8
Country of publishing house
US - UNITED STATES
Number of pages
12
Pages from-to
085301
UT code for WoS article
000755022000001
EID of the result in the Scopus database
2-s2.0-85113704562