Role of oxygen in suppression of boron incorporation in diamond films: Surface reactions insight
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00637516" target="_blank" >RIV/68378271:_____/25:00637516 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.apsusc.2025.163832" target="_blank" >https://doi.org/10.1016/j.apsusc.2025.163832</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2025.163832" target="_blank" >10.1016/j.apsusc.2025.163832</a>
Alternative languages
Result language
angličtina
Original language name
Role of oxygen in suppression of boron incorporation in diamond films: Surface reactions insight
Original language description
This study explores the underlying mechanisms through which oxygen-containing species suppress boron incorporation in diamond films grown via chemical vapor deposition. A comprehensive understanding of the mechanisms affecting the boron incorporation is crucial for achieving effective control over the doping process. Our experiments demonstrate significantly suppressed boron incorporation after the addition of CO2 to the gas mixture. A notable divergence is observed between the suppression of BH emission intensity in plasma and the actual B incorporation into the diamond layer across a wide range of B/C ratios. Contrary to previous hypotheses attributing the suppression solely to gas phase boron depletion, our findings indicate that surface-related reactions are the primary mechanism. Density functional theory calculations reveal that oxygen and OH radicals promote the desorption of boron-containing species, such as OBH, from the diamond surface, whereas CO and CO2 desorb from the surface without detaching the B atom. The experimental results and theoretical calculations suggest that oxygen hinders boron incorporation into the diamond lattice by forming volatile oxygen-boron compounds and by occupation of surface sites. Our study provides new mechanistic insights into pathways for precise control of boron incorporation, allowing the optimization of boron-doped diamond properties for advanced electronic and electrochemical applications.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Surface Science
ISSN
0169-4332
e-ISSN
1873-5584
Volume of the periodical
709
Issue of the periodical within the volume
Nov
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
9
Pages from-to
163832
UT code for WoS article
001517673400008
EID of the result in the Scopus database
2-s2.0-105008518303