Imaging in nanoscale using laser-plasma sources of extreme ultraviolet (EUV)

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F14%3A00309469" target="_blank" >RIV/68407700:21460/14:00309469 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1007/978-3-319-00696-3_43" target="_blank" >http://dx.doi.org/10.1007/978-3-319-00696-3_43</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/978-3-319-00696-3_43" target="_blank" >10.1007/978-3-319-00696-3_43</a>

Result language

angličtina

Original language name

Imaging in nanoscale using laser-plasma sources of extreme ultraviolet (EUV)

Original language description

New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy, based on Fresnel zone plates. In this paper, we report on applications of a desk-top microscopy using a laser-plasma EUV source based on a gas-puff target for studies of morphology of thin silicon membranes coated with NaCl crystals and samples composed of ZnO nanofibers.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

<a href="/en/project/EE.2.3.20.0092" target="_blank" >EE.2.3.20.0092: BIO-XUV Research Team Advancement at FBME CTU</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

X-Ray Lasers 2012

ISBN

978-3-319-00696-3

ISSN

0930-8989

e-ISSN

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Number of pages

8

Pages from-to

269-276

Publisher name

Springer International Publishing

Place of publication

Cham

Event location

Paris

Event date

Jun 11, 2012

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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