Comparison of ohmic contact formation of titanium and zirconium on boron doped diamond

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21460%2F18%3A00331256" target="_blank" >RIV/68407700:21460/18:00331256 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/18:00501101 RIV/61388955:_____/18:00501101

Result on the web

<a href="https://doi.org/10.1557/adv.2018.39" target="_blank" >https://doi.org/10.1557/adv.2018.39</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1557/adv.2018.39" target="_blank" >10.1557/adv.2018.39</a>

Result language

angličtina

Original language name

Comparison of ohmic contact formation of titanium and zirconium on boron doped diamond

Original language description

With a high affinity to carbon comparable to titanium and an electrically conductive carbide, zirconium has potential to form ohmic contact on boron doped diamond. In this work, formation of ohmic contacts on boron doped diamond using zirconium is studied in comparison to titanium. Boron doped diamond epitaxial layers have been grown by microwave plasma enhanced chemical vapour deposition with various B/C ratio. Circular Transmission Line Model structures were fabricated using standard micro-fabrication technologies. Specific contact resistance of fabricated contacts was determined for different boron concentrations and for various annealing temperatures. Ohmic contacts using zirconium are formed after annealing at 400 °C. Specific contact resistance steadily decreases with high temperature annealing down to a value of ca. 1 mΩ.cm2 after annealing at 700 °C for highly boron doped diamond. In comparison, titanium contact fabricated on highly doped diamond appears not stable under high temperature annealing.

Czech name

—

Czech description

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Type

J_ost - Miscellaneous article in a specialist periodical

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2018

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

MRS Advances

ISSN

2059-8521

e-ISSN

2059-8521

Volume of the periodical

3

Issue of the periodical within the volume

33

Country of publishing house

GB - UNITED KINGDOM

Number of pages

5

Pages from-to

1931-1935

UT code for WoS article

000438845800010

EID of the result in the Scopus database

2-s2.0-85049554543