Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F21%3AN0000009" target="_blank" >RIV/00177016:_____/21:N0000009 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216224:14310/21:00119065 RIV/00216305:26620/21:PU142107

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0141391021001488" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0141391021001488</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.polymdegradstab.2021.109628" target="_blank" >10.1016/j.polymdegradstab.2021.109628</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments

Popis výsledku v původním jazyce

In the present work, SiOCH coatings were prepared in capacitively coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. Properties of thin solid films prepared using continuous wave (CW) plasma and pulsed wave (PW) plasma were examined, including long–term stability in contact with air and water environments. The presented study proves that it is possible to prepare organosilicon coatings showing properties in a wide range from soft organic polymeric structures to materials similar to SiO2 with Martens hardness of 4 GPa. The content of carbon species in organosilicon structure and water contact angle (WCA) decreased with increasing oxygen ratio from 7.7 % to 75.0 %. The water contact angle of TMSAc-based coatings prepared in CW mode decreased from 95° to 76°. The application of pulsed mode using an oxygen ratio of 50 % and pulse repetition frequencies in the range of 0.33 Hz to 300 Hz led to materials with hydrophobic character (WCA in range of 86°–94°) with increased content of CH and Si-CH structures in comparison to CW mode. This study proves that the aging mechanism significantly depends on deposition parameters. The increase of oxygen ratio, as well as the increase of pulse repetition frequency, led to the higher resistance towards the atmospheric environment. On the other side, organosilicon coatings prepared in CW mode using high oxygen ratios (50–75 %) showed significant delamination after immersion in water. However, the use of PW plasma for the preparation of SiOCH thin films significantly improved the stability of resulting materials under water environment.

Název v anglickém jazyce

Stability of trimethylsilyl acetate-based plasma polymers towards atmospheric and water environments

Popis výsledku anglicky

In the present work, SiOCH coatings were prepared in capacitively coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. Properties of thin solid films prepared using continuous wave (CW) plasma and pulsed wave (PW) plasma were examined, including long–term stability in contact with air and water environments. The presented study proves that it is possible to prepare organosilicon coatings showing properties in a wide range from soft organic polymeric structures to materials similar to SiO2 with Martens hardness of 4 GPa. The content of carbon species in organosilicon structure and water contact angle (WCA) decreased with increasing oxygen ratio from 7.7 % to 75.0 %. The water contact angle of TMSAc-based coatings prepared in CW mode decreased from 95° to 76°. The application of pulsed mode using an oxygen ratio of 50 % and pulse repetition frequencies in the range of 0.33 Hz to 300 Hz led to materials with hydrophobic character (WCA in range of 86°–94°) with increased content of CH and Si-CH structures in comparison to CW mode. This study proves that the aging mechanism significantly depends on deposition parameters. The increase of oxygen ratio, as well as the increase of pulse repetition frequency, led to the higher resistance towards the atmospheric environment. On the other side, organosilicon coatings prepared in CW mode using high oxygen ratios (50–75 %) showed significant delamination after immersion in water. However, the use of PW plasma for the preparation of SiOCH thin films significantly improved the stability of resulting materials under water environment.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10404 - Polymer science

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Polymer degradation and stability

ISSN

0141-3910

e-ISSN

—

Svazek periodika

190

Číslo periodika v rámci svazku

August 2021

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

19

Strana od-do

—

Kód UT WoS článku

000679440900013

EID výsledku v databázi Scopus

2-s2.0-85111071810