Deposition of organosilicon coatings from trimethylsilyl acetate and oxygen gases in capacitively coupled RF glow discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F20%3A00114381" target="_blank" >RIV/00216224:14310/20:00114381 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.porgcoat.2020.105927" target="_blank" >https://doi.org/10.1016/j.porgcoat.2020.105927</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.porgcoat.2020.105927" target="_blank" >10.1016/j.porgcoat.2020.105927</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of organosilicon coatings from trimethylsilyl acetate and oxygen gases in capacitively coupled RF glow discharge

Popis výsledku v původním jazyce

The aim of the present work was to prepare SiOxCyHz coatings in capacitively-coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. The properties of deposited coatings have been investigated using several characterization methods. The presented study proves that properties of TMSAc-based thin films are significantly dependent on the monomer ratio in TMSAc/O2 mixture which varied from 25.0% to 92.3%. Using a low TMSAc ratio (high content of oxygen gas) resulted in organosilicon materials similar to SiO2 in terms of chemical composition and mechanical properties. Increasing the fraction of TMSAc in gaseous mixture led to the formation of more organic polymeric structures enriched with carbon atoms bonded in CHx chains. Values of Martens hardness decreased from 3.97 to 0.76 GPa with increasing TMSAc fraction from 25.0% to 92.3%. The degree of hydrophobicity of prepared coatings evolved in accordance with observed structural changes corresponding to applied monomer ratios. The water contact angle gradually increased from 75.0° to 95.3° with increasing TMSAc fraction. The prepared TMSAc plasma polymers became more hydrophobic with more intensive integration of hydrocarbon species into the surface structure.

Název v anglickém jazyce

Deposition of organosilicon coatings from trimethylsilyl acetate and oxygen gases in capacitively coupled RF glow discharge

Popis výsledku anglicky

The aim of the present work was to prepare SiOxCyHz coatings in capacitively-coupled RF glow discharge from gaseous mixture of trimethylsilyl acetate (TMSAc) monomer and oxygen. The properties of deposited coatings have been investigated using several characterization methods. The presented study proves that properties of TMSAc-based thin films are significantly dependent on the monomer ratio in TMSAc/O2 mixture which varied from 25.0% to 92.3%. Using a low TMSAc ratio (high content of oxygen gas) resulted in organosilicon materials similar to SiO2 in terms of chemical composition and mechanical properties. Increasing the fraction of TMSAc in gaseous mixture led to the formation of more organic polymeric structures enriched with carbon atoms bonded in CHx chains. Values of Martens hardness decreased from 3.97 to 0.76 GPa with increasing TMSAc fraction from 25.0% to 92.3%. The degree of hydrophobicity of prepared coatings evolved in accordance with observed structural changes corresponding to applied monomer ratios. The water contact angle gradually increased from 75.0° to 95.3° with increasing TMSAc fraction. The prepared TMSAc plasma polymers became more hydrophobic with more intensive integration of hydrocarbon species into the surface structure.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Progress in Organic Coatings

ISSN

0300-9440

e-ISSN

1873-331X

Svazek periodika

149

Číslo periodika v rámci svazku

December 2020

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

1-8

Kód UT WoS článku

000582966200024

EID výsledku v databázi Scopus

2-s2.0-85091257673