Study of structural and electrical properties of thin NiOx films prepared by ion beam sputtering of Ni and subsequent thermo-oxidation

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10173491" target="_blank" >RIV/00216208:11320/13:10173491 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/13:00421053 RIV/60461373:22340/13:43895836

Výsledek na webu

<a href="http://dx.doi.org/10.1140/epjb/e2013-30969-6" target="_blank" >http://dx.doi.org/10.1140/epjb/e2013-30969-6</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1140/epjb/e2013-30969-6" target="_blank" >10.1140/epjb/e2013-30969-6</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Study of structural and electrical properties of thin NiOx films prepared by ion beam sputtering of Ni and subsequent thermo-oxidation

Popis výsledku v původním jazyce

Nickel oxide thin films were prepared by thermal annealing of thin Ni films (thickness ca 47 nm) deposited by ion beam sputtering. The thermal annealing was performed at 350 degrees C and 400 degrees C with elected time (1-7 hours) in a quartz furnace opened to air. During annealing the samples underwent structural changes, as well as changes of their electrical properties. The structural properties (surface morphology and occurrence of crystalline phases) were analyzed by the AFM and XRD methods, O andNi depth concentration profiles by the NRA method, and electrical properties (sheet resistance) by the van der Pauw 4-point technique. The sheet resistance (R-S) of the as-deposited sample was found to be 12.03 Omega/square; after open air thermal annealing at 350 degrees C for 1 h the value was found to be almost the same, 11.67 Omega/square. After 2 h of annealing, however, a sharp increase in the sheet resistance (R-S = 1.46 M Omega/square) was observed. At this stage the deposit for

Název v anglickém jazyce

Study of structural and electrical properties of thin NiOx films prepared by ion beam sputtering of Ni and subsequent thermo-oxidation

Popis výsledku anglicky

Nickel oxide thin films were prepared by thermal annealing of thin Ni films (thickness ca 47 nm) deposited by ion beam sputtering. The thermal annealing was performed at 350 degrees C and 400 degrees C with elected time (1-7 hours) in a quartz furnace opened to air. During annealing the samples underwent structural changes, as well as changes of their electrical properties. The structural properties (surface morphology and occurrence of crystalline phases) were analyzed by the AFM and XRD methods, O andNi depth concentration profiles by the NRA method, and electrical properties (sheet resistance) by the van der Pauw 4-point technique. The sheet resistance (R-S) of the as-deposited sample was found to be 12.03 Omega/square; after open air thermal annealing at 350 degrees C for 1 h the value was found to be almost the same, 11.67 Omega/square. After 2 h of annealing, however, a sharp increase in the sheet resistance (R-S = 1.46 M Omega/square) was observed. At this stage the deposit for

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

<a href="/cs/project/GBP108%2F12%2FG108" target="_blank" >GBP108/12/G108: Příprava, modifikace a charakterizace materiálů zářením</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

European Physical Journal B

ISSN

1434-6028

e-ISSN

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Svazek periodika

86

Číslo periodika v rámci svazku

11

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

6

Strana od-do

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Kód UT WoS článku

000326811500006

EID výsledku v databázi Scopus

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