Nickel oxide films by thermal annealing of ion-beam-sputtered Ni: Structure and electro-optical properties

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F17%3A00485884" target="_blank" >RIV/61389005:_____/17:00485884 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/17:00485884 RIV/44555601:13440/17:43892965 RIV/00216208:11320/17:10364870

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.tsf.2017.08.047" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2017.08.047</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2017.08.047" target="_blank" >10.1016/j.tsf.2017.08.047</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nickel oxide films by thermal annealing of ion-beam-sputtered Ni: Structure and electro-optical properties

Popis výsledku v původním jazyce

Nickel oxide films were prepared by thermal annealing of Ni deposited by ion beam sputtering on Si (or glass) substrates. The annealing was carried out in a laboratory furnace open to air at temperatures 350 degrees C-500 degrees C with annealing time 1-7 h (1-h step). For as-deposited Ni films the sheet resistance R-S was found to be 8.39 Omega/square and no significant XRD diffraction peaks were observed. The thermal annealing resulted in significant changes in composition and electrical, structural and optical properties. The oxidation process led to a rapid growth of R-S up to 10(9)Omega/square, appearance of the optical absorption edge for oxidized Ni, and the formation of a polycrystalline NiO structure with the main NiO (111) diffraction peak. At 350 degrees C the annealing yielded 3-stage behavior of the sheet resistance due to limited oxidation during short time annealing. Longer processing times (>3 h) were necessary to successfully oxidize the deposited Ni film, after 1 h annealing the oxygen content (analyzed by nuclear resonance analysis) showed a significantly lower concentration within the depth of a sample, more uniform composition was found after prolonged annealing. XPS analysis showed the formation of a significant amount of nickel hydroxide at the surface. It was confirmed by ERDA. The optical properties were studied by Photothermal Deflection Spectroscopy (PDS). The data correlate with the 3-stage behavior of sheet resistance at 350 degrees C, suggesting lower oxidation during short-term annealing, while transparent nickel oxide films were formed during longer annealing and at higher temperatures. Based on analysis of the obtained experimental data (from measurement of the sheet resistance, XRD diffraction and optical absorption spectra), the temperature of 400 degrees C was found to be optimal for the formation of the fully oxidized NiO films.

Název v anglickém jazyce

Nickel oxide films by thermal annealing of ion-beam-sputtered Ni: Structure and electro-optical properties

Popis výsledku anglicky

Nickel oxide films were prepared by thermal annealing of Ni deposited by ion beam sputtering on Si (or glass) substrates. The annealing was carried out in a laboratory furnace open to air at temperatures 350 degrees C-500 degrees C with annealing time 1-7 h (1-h step). For as-deposited Ni films the sheet resistance R-S was found to be 8.39 Omega/square and no significant XRD diffraction peaks were observed. The thermal annealing resulted in significant changes in composition and electrical, structural and optical properties. The oxidation process led to a rapid growth of R-S up to 10(9)Omega/square, appearance of the optical absorption edge for oxidized Ni, and the formation of a polycrystalline NiO structure with the main NiO (111) diffraction peak. At 350 degrees C the annealing yielded 3-stage behavior of the sheet resistance due to limited oxidation during short time annealing. Longer processing times (>3 h) were necessary to successfully oxidize the deposited Ni film, after 1 h annealing the oxygen content (analyzed by nuclear resonance analysis) showed a significantly lower concentration within the depth of a sample, more uniform composition was found after prolonged annealing. XPS analysis showed the formation of a significant amount of nickel hydroxide at the surface. It was confirmed by ERDA. The optical properties were studied by Photothermal Deflection Spectroscopy (PDS). The data correlate with the 3-stage behavior of sheet resistance at 350 degrees C, suggesting lower oxidation during short-term annealing, while transparent nickel oxide films were formed during longer annealing and at higher temperatures. Based on analysis of the obtained experimental data (from measurement of the sheet resistance, XRD diffraction and optical absorption spectra), the temperature of 400 degrees C was found to be optimal for the formation of the fully oxidized NiO films.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

640

Číslo periodika v rámci svazku

10

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

52-59

Kód UT WoS článku

000413804900009

EID výsledku v databázi Scopus

2-s2.0-85028805322