Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10288012" target="_blank" >RIV/00216208:11320/14:10288012 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1021/am4049546" target="_blank" >http://dx.doi.org/10.1021/am4049546</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/am4049546" target="_blank" >10.1021/am4049546</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

Popis výsledku v původním jazyce

The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show thatthe structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effect resulting in the formation of nanostructured cerium oxide films with large surface. In this regard, results of oxygen plasma treatment of a-C and CNx, films are presented. Gradual material erosion with increasing duration of plasma impact accompanied by modification of the surface roughness is repo

Název v anglickém jazyce

Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

Popis výsledku anglicky

The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show thatthe structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effect resulting in the formation of nanostructured cerium oxide films with large surface. In this regard, results of oxygen plasma treatment of a-C and CNx, films are presented. Gradual material erosion with increasing duration of plasma impact accompanied by modification of the surface roughness is repo

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

<a href="/cs/project/GA13-10396S" target="_blank" >GA13-10396S: Nové materiály pro planární palivové články</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

ACS applied materials &amp; interfaces

ISSN

1944-8244

e-ISSN

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Svazek periodika

6

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

6

Strana od-do

1213-1218

Kód UT WoS článku

000330201900065

EID výsledku v databázi Scopus

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