Sputtering of Glass Dust Grain by Ions and Electrons

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10290834" target="_blank" >RIV/00216208:11320/14:10290834 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf14/WDS14_64_f2_Vysinka.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf14/WDS14_64_f2_Vysinka.pdf</a>

DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Sputtering of Glass Dust Grain by Ions and Electrons

Popis výsledku v původním jazyce

Glass (SiO2) is sputtered not only by ion impact, but the sputtering yield can be enhanced by electron impact as well. In the case of small silicate dust grains in the space environment, such eects can in uence the lifetime of the grains. Moreover, thereis a suggestion that electric eld could further enhance the sputtering yield from charged non-conducting grains. To reveal these eects, we performed experiments with a single dust grain levitated in an electrodynamic quadrupole trap. As a representativeof silicate-type space dust, we used spherical SiO2 grains with diameters around 1 micron. The grain in the trap was bombarded by 2-keV Ar+ ions and 1-keV electrons. The sputtering yield of the ion-only bombardment (i.e., at a high surface eld) was 1.4SiO2/ion, in the case of a combined ion and electron bombardment, the yield was 1.5 SiO2/ion, i.e., slightly higher.

Název v anglickém jazyce

Sputtering of Glass Dust Grain by Ions and Electrons

Popis výsledku anglicky

Glass (SiO2) is sputtered not only by ion impact, but the sputtering yield can be enhanced by electron impact as well. In the case of small silicate dust grains in the space environment, such eects can in uence the lifetime of the grains. Moreover, thereis a suggestion that electric eld could further enhance the sputtering yield from charged non-conducting grains. To reveal these eects, we performed experiments with a single dust grain levitated in an electrodynamic quadrupole trap. As a representativeof silicate-type space dust, we used spherical SiO2 grains with diameters around 1 micron. The grain in the trap was bombarded by 2-keV Ar+ ions and 1-keV electrons. The sputtering yield of the ion-only bombardment (i.e., at a high surface eld) was 1.4SiO2/ion, in the case of a combined ion and electron bombardment, the yield was 1.5 SiO2/ion, i.e., slightly higher.

Druh

D - Stať ve sborníku

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

WDS 2014 - Proceedings of Contributed Papers - Physics

ISBN

978-80-7378-276-4

ISSN

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e-ISSN

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Počet stran výsledku

7

Strana od-do

371-377

Název nakladatele

Matfyzpress

Místo vydání

Praha

Místo konání akce

Praha

Datum konání akce

3. 6. 2014

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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