Plasma diagnostics and characterization of the Mg and Mg-Zn thin films deposited by thermionic vacuum arc (TVA) method

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10405885" target="_blank" >RIV/00216208:11320/19:10405885 - isvavai.cz</a>

Výsledek na webu

<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=C4ruW0F45f" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=C4ruW0F45f</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2019.06.002" target="_blank" >10.1016/j.vacuum.2019.06.002</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Plasma diagnostics and characterization of the Mg and Mg-Zn thin films deposited by thermionic vacuum arc (TVA) method

Popis výsledku v původním jazyce

The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10(-4) Pa. The advantage of this technology is the comparatively high deposition rate while keeping good properties of the deposited films. The aim of this paper is to report on the characterization of the Mg and Mg-Zn thin films deposited by the TVA method. By careful selection of the deposition parameters, we have achieved a rather stable discharge that resulted in good film properties. The surface morphology and wettability of the deposited Mg and Mg-Zn thin films were investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM) and free surface energy (FSE) by surface energy evaluation system. The results revealed that the size of crystallites is 5.0 nm in the case of Mg-Zn/Si and 6.5 nm in the case of Mg/Si sample; a promising result for future applications of the TVA. The film properties are complemented by plasma parameters measured by a heated probe.

Název v anglickém jazyce

Plasma diagnostics and characterization of the Mg and Mg-Zn thin films deposited by thermionic vacuum arc (TVA) method

Popis výsledku anglicky

The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10(-4) Pa. The advantage of this technology is the comparatively high deposition rate while keeping good properties of the deposited films. The aim of this paper is to report on the characterization of the Mg and Mg-Zn thin films deposited by the TVA method. By careful selection of the deposition parameters, we have achieved a rather stable discharge that resulted in good film properties. The surface morphology and wettability of the deposited Mg and Mg-Zn thin films were investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM) and free surface energy (FSE) by surface energy evaluation system. The results revealed that the size of crystallites is 5.0 nm in the case of Mg-Zn/Si and 6.5 nm in the case of Mg/Si sample; a promising result for future applications of the TVA. The film properties are complemented by plasma parameters measured by a heated probe.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA19-00579S" target="_blank" >GA19-00579S: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

167

Číslo periodika v rámci svazku

Sep

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

7

Strana od-do

129-135

Kód UT WoS článku

000482245800020

EID výsledku v databázi Scopus

2-s2.0-85066946773