Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F22%3A10448124" target="_blank" >RIV/00216208:11320/22:10448124 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216224:14310/22:00128099

Výsledek na webu

<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9iP3uBzPyp" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=9iP3uBzPyp</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1103/PhysRevE.106.035302" target="_blank" >10.1103/PhysRevE.106.035302</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition

Popis výsledku v původním jazyce

We present a numerical model of epitaxial thin-film growth applicable for pulsed-laser deposition on a single crystalline substrate. The model is based on rate equations describing the time development of monolayer coverages and of densities of movable particles on atomically flat terraces. Numerical solution of the equations showed that the time dependence of surface roughness obeys a scaling law, the exponent of which depends on probabilities of various atomistic processes included in the simulation model. From the time dependence of monolayer coverages we calculated x-ray diffracted intensity in a quasiforbidden anti-Bragg reflection and showed that its oscillatory behavior is affected by these probabilities as well. The results show the possibility to study atomistic processes during the deposition from the time dependence of the anti-Bragg intensity measured during deposition.

Název v anglickém jazyce

Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition

Popis výsledku anglicky

We present a numerical model of epitaxial thin-film growth applicable for pulsed-laser deposition on a single crystalline substrate. The model is based on rate equations describing the time development of monolayer coverages and of densities of movable particles on atomically flat terraces. Numerical solution of the equations showed that the time dependence of surface roughness obeys a scaling law, the exponent of which depends on probabilities of various atomistic processes included in the simulation model. From the time dependence of monolayer coverages we calculated x-ray diffracted intensity in a quasiforbidden anti-Bragg reflection and showed that its oscillatory behavior is affected by these probabilities as well. The results show the possibility to study atomistic processes during the deposition from the time dependence of the anti-Bragg intensity measured during deposition.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GC19-10799J" target="_blank" >GC19-10799J: Studium růstové kinetiky multiferoických komplexních oxidů metodami rtg rozptylu in-situ při pulsní laserové depozici</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Physical Review E

ISSN

2470-0045

e-ISSN

2470-0053

Svazek periodika

106

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

035302

Kód UT WoS článku

000874981300004

EID výsledku v databázi Scopus

2-s2.0-85138450301