Temperature-Driven Morphological and Microstructural Changes of Gold Nanoparticles Prepared by Aggregation from the Gas Phase
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F25%3A10503797" target="_blank" >RIV/00216208:11320/25:10503797 - isvavai.cz</a>
Výsledek na webu
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=gbLi62Q48Z" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=gbLi62Q48Z</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1021/acsomega.5c02149" target="_blank" >10.1021/acsomega.5c02149</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Temperature-Driven Morphological and Microstructural Changes of Gold Nanoparticles Prepared by Aggregation from the Gas Phase
Popis výsledku v původním jazyce
The effect of annealing on the thin layers of gold and gold nanoparticles in air was studied by statistically relevant X-ray scattering methods. The nanoparticle behavior is found to depend on the substrate coverage and annealing temperature. During annealing up to 450 degrees C, the size of single-crystalline nanoparticles gradually increases through the process of Ostwald ripening, while the density of crystallographic defects decreases slightly. An abrupt change occurs above 450 degrees C, whereas no significant evolution is observed for the less covered sample; at the sample with more material, the nanoparticles coalesce, and their shape becomes more rounded by further annealing. Only after the spheroidization is completed do the sizes of crystallites follow the nanoparticle size growth. Comparison with the thin continuous gold layer shows that the healing of the crystallographic defects, i.e., microstrain and stacking faults, takes place at significantly lower temperatures if the material is evenly distributed on the silicon substrate surface. However, annealed nanoparticle layers provide a much narrower particle size distribution when compared to a dewetted gold thin layer. At around 800 degrees C, the alignment of the gold crystal structure toward the substrate is detected, and it changes from the random distribution of the atomic planes given by the random initial orientation of deposited nanoparticles. Another interesting phenomenon occurs for annealing above 1000 degrees C; for the nanoparticle layers, the smallest nanoparticles evaporate, leaving holes in the SiO2 surface layer.
Název v anglickém jazyce
Temperature-Driven Morphological and Microstructural Changes of Gold Nanoparticles Prepared by Aggregation from the Gas Phase
Popis výsledku anglicky
The effect of annealing on the thin layers of gold and gold nanoparticles in air was studied by statistically relevant X-ray scattering methods. The nanoparticle behavior is found to depend on the substrate coverage and annealing temperature. During annealing up to 450 degrees C, the size of single-crystalline nanoparticles gradually increases through the process of Ostwald ripening, while the density of crystallographic defects decreases slightly. An abrupt change occurs above 450 degrees C, whereas no significant evolution is observed for the less covered sample; at the sample with more material, the nanoparticles coalesce, and their shape becomes more rounded by further annealing. Only after the spheroidization is completed do the sizes of crystallites follow the nanoparticle size growth. Comparison with the thin continuous gold layer shows that the healing of the crystallographic defects, i.e., microstrain and stacking faults, takes place at significantly lower temperatures if the material is evenly distributed on the silicon substrate surface. However, annealed nanoparticle layers provide a much narrower particle size distribution when compared to a dewetted gold thin layer. At around 800 degrees C, the alignment of the gold crystal structure toward the substrate is detected, and it changes from the random distribution of the atomic planes given by the random initial orientation of deposited nanoparticles. Another interesting phenomenon occurs for annealing above 1000 degrees C; for the nanoparticle layers, the smallest nanoparticles evaporate, leaving holes in the SiO2 surface layer.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)
Návaznosti výsledku
Projekt
<a href="/cs/project/GA22-16667S" target="_blank" >GA22-16667S: Syntéza nanomateriálů na bázi oxidů kovů pro povrchem zesílenou Ramanovu spektroskopii pomocí plazmových plynně agregačních zdrojů</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2025
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
ACS Omega
ISSN
2470-1343
e-ISSN
2470-1343
Svazek periodika
10
Číslo periodika v rámci svazku
21
Stát vydavatele periodika
US - Spojené státy americké
Počet stran výsledku
10
Strana od-do
22052-22061
Kód UT WoS článku
001493038100001
EID výsledku v databázi Scopus
2-s2.0-105005521292