Charakterizace wolframových tenkých vrstev deponovaných termoionický vakuovým obloukem (TVA)

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00016723" target="_blank" >RIV/00216224:14310/06:00016723 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

Popis výsledku v původním jazyce

In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnificationof 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeissmicrohardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We

Název v anglickém jazyce

Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

Popis výsledku anglicky

In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnificationof 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeissmicrohardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2006

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Optoelectronics and Advanced Materials

ISSN

1454-4164

e-ISSN

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Svazek periodika

8

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

RO - Rumunsko

Počet stran výsledku

3

Strana od-do

71

Kód UT WoS článku

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EID výsledku v databázi Scopus

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