Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00017371" target="_blank" >RIV/00216224:14310/06:00017371 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

Popis výsledku v původním jazyce

In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows depositionof dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness

Název v anglickém jazyce

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

Popis výsledku anglicky

In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows depositionof dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2006

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & coatings technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

200

Číslo periodika v rámci svazku

22-23

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

4

Strana od-do

6517-6521

Kód UT WoS článku

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EID výsledku v databázi Scopus

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