Carbon nanostructures synthesis in microwave plasma torch at atmospheric pressure

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00028950" target="_blank" >RIV/00216224:14310/06:00028950 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

čeština

Název v původním jazyce

Carbon nanostructures synthesis in microwave plasma torch at atmospheric pressure

Popis výsledku v původním jazyce

We have successfully synthesized CNTs in microwave plasma torch at atmospheric pressure from the mixture of methane, hydrogen and argon. The plasma torch was generated at the frequency of 2.45 GHz using an iron hollow electrode. Argon (1000 sccm) was flowing through the electrode whereas methane (10-40 sccm) and hydrogen (100-400 sccm) were added to the expanding torch from outside. The CNTs were grown on substrates placed at various distances from the torch electrode. The substrates were silicon wafers(10x15 mm) with deposited 200 nm thick silicon oxide layer and thin layer (5-20 nm) of iron catalyst on the top. The samples were imaged by scanning electron microscopy(SEM) and transmission electron microscopy(TEM). The processes in the discharge were monitored by optical emission spectroscopy(OES). The SEM analysis showed presence of well aligned 50 micrometer long multi-wall CNTs with narrow diameter distribution centered around 20 nm.

Název v anglickém jazyce

Carbon nanostructures synthesis in microwave plasma torch at atmospheric pressure

Popis výsledku anglicky

We have successfully synthesized CNTs in microwave plasma torch at atmospheric pressure from the mixture of methane, hydrogen and argon. The plasma torch was generated at the frequency of 2.45 GHz using an iron hollow electrode. Argon (1000 sccm) was flowing through the electrode whereas methane (10-40 sccm) and hydrogen (100-400 sccm) were added to the expanding torch from outside. The CNTs were grown on substrates placed at various distances from the torch electrode. The substrates were silicon wafers(10x15 mm) with deposited 200 nm thick silicon oxide layer and thin layer (5-20 nm) of iron catalyst on the top. The samples were imaged by scanning electron microscopy(SEM) and transmission electron microscopy(TEM). The processes in the discharge were monitored by optical emission spectroscopy(OES). The SEM analysis showed presence of well aligned 50 micrometer long multi-wall CNTs with narrow diameter distribution centered around 20 nm.

Druh

D - Stať ve sborníku

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GA202%2F05%2F0607" target="_blank" >GA202/05/0607: Příprava uhlíkových mikro- a nanostruktur plazmovými technologiemi</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2006

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Book of Abstracts 3rd International conference on microwave chemistry

ISBN

80-210-4070-X

ISSN

—

e-ISSN

—

Počet stran výsledku

1

Strana od-do

—

Název nakladatele

Masaryk University

Místo vydání

Brno

Místo konání akce

Brno

Datum konání akce

1. 1. 2006

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

—