Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F08%3A00025189" target="_blank" >RIV/00216224:14310/08:00025189 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Popis výsledku v původním jazyce
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of thecommon techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aimof this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Název v anglickém jazyce
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Popis výsledku anglicky
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of thecommon techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aimof this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
BL - Fyzika plasmatu a výboje v plynech
OECD FORD obor
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Návaznosti výsledku
Projekt
<a href="/cs/project/GA202%2F07%2F1669" target="_blank" >GA202/07/1669: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2008
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů