Spatial Atomic Layer Deposition: performance of low temperature H20 and O3 oxidant chemistry for flexible electronics encapsulation.

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F15%3A00094216" target="_blank" >RIV/00216224:14310/15:00094216 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1116/1.4914079" target="_blank" >http://dx.doi.org/10.1116/1.4914079</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4914079" target="_blank" >10.1116/1.4914079</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Spatial Atomic Layer Deposition: performance of low temperature H20 and O3 oxidant chemistry for flexible electronics encapsulation.

Popis výsledku v původním jazyce

Water and oxygen were compared as oxidizing agents for the Al2O3 atomic layer deposition process using spatial atomic layer deposition reactor. The influence of the precursor dose on the deposition rate and refractive index, which was used as a proxy for film density, was measured as a function of residence time, defined as the time which the moving substrate spent within one precursor gas zone. The effect of temperature on the growth characteristics was also measured. The water-based process gave faster deposition rates and higher refractive indices but the ozone process allowed deposition to take place at lower temperatures while still maintaining good film quality. In general, processes based on both oxidation chemistries were able to produce excellent moisture barrier films with water vapor transmission rate levels of 10(-4) g/m(2) day measured at 38 degrees C and 90% of relative humidity on polyethylene naphthalate substrates.

Název v anglickém jazyce

Spatial Atomic Layer Deposition: performance of low temperature H20 and O3 oxidant chemistry for flexible electronics encapsulation.

Popis výsledku anglicky

Water and oxygen were compared as oxidizing agents for the Al2O3 atomic layer deposition process using spatial atomic layer deposition reactor. The influence of the precursor dose on the deposition rate and refractive index, which was used as a proxy for film density, was measured as a function of residence time, defined as the time which the moving substrate spent within one precursor gas zone. The effect of temperature on the growth characteristics was also measured. The water-based process gave faster deposition rates and higher refractive indices but the ozone process allowed deposition to take place at lower temperatures while still maintaining good film quality. In general, processes based on both oxidation chemistries were able to produce excellent moisture barrier films with water vapor transmission rate levels of 10(-4) g/m(2) day measured at 38 degrees C and 90% of relative humidity on polyethylene naphthalate substrates.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BE - Teoretická fyzika

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

J. Vac. Sci. Technol. A

ISSN

0734-2101

e-ISSN

—

Svazek periodika

33

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

8

Strana od-do

"nestrankovano"

Kód UT WoS článku

000355741800029

EID výsledku v databázi Scopus

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