Optical spectroscopy as a tool for visualization of sputtering plasma dynamics

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00105340" target="_blank" >RIV/00216224:14310/18:00105340 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Optical spectroscopy as a tool for visualization of sputtering plasma dynamics

Popis výsledku v původním jazyce

This work combines various optical diagnostic methods for in-situ characterization of high-power impulse magnetron sputtering (HiPIMS) process. Special attention is devoted to two-dimensional visualization of the ground state sputtered atoms in the discharge volume. Laser-induced fluorescence and optical absorption spectroscopy represent two main diagnostic techniques which have been combined for the discharge diagnostics. As a result of discharge characterization the number densities as well as the particularities of propagation of the neutral and ionized sputtered Ti atoms were significantly clarified. The effects of HiPIMS plasma-on and plasma-off time duration on the Ti ionization as well as on the general evolution of density distribution in the discharge volume have been studied, demonstrating the importance of plasma pulse duration as well as the pulse energy for controlling the discharge properties.

Název v anglickém jazyce

Optical spectroscopy as a tool for visualization of sputtering plasma dynamics

Popis výsledku anglicky

This work combines various optical diagnostic methods for in-situ characterization of high-power impulse magnetron sputtering (HiPIMS) process. Special attention is devoted to two-dimensional visualization of the ground state sputtered atoms in the discharge volume. Laser-induced fluorescence and optical absorption spectroscopy represent two main diagnostic techniques which have been combined for the discharge diagnostics. As a result of discharge characterization the number densities as well as the particularities of propagation of the neutral and ionized sputtered Ti atoms were significantly clarified. The effects of HiPIMS plasma-on and plasma-off time duration on the Ti ionization as well as on the general evolution of density distribution in the discharge volume have been studied, demonstrating the importance of plasma pulse duration as well as the pulse energy for controlling the discharge properties.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/LO1411" target="_blank" >LO1411: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů