Highly ionized physical vapor deposition plasma source working at very low pressure

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00377251" target="_blank" >RIV/68378271:_____/12:00377251 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/12:10130624

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.3699229" target="_blank" >http://dx.doi.org/10.1063/1.3699229</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.3699229" target="_blank" >10.1063/1.3699229</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Highly ionized physical vapor deposition plasma source working at very low pressure

Popis výsledku v původním jazyce

Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS)discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p=0.05 Pa;this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne 1018m 3, measured during the HiPIMS pulse.

Název v anglickém jazyce

Highly ionized physical vapor deposition plasma source working at very low pressure

Popis výsledku anglicky

Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS)discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p=0.05 Pa;this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne 1018m 3, measured during the HiPIMS pulse.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Physics Letters

ISSN

0003-6951

e-ISSN

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Svazek periodika

100

Číslo periodika v rámci svazku

14

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

3

Strana od-do

"141604-1"-"141604-3"

Kód UT WoS článku

000302567800013

EID výsledku v databázi Scopus

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