Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F20%3A00114195" target="_blank" >RIV/00216224:14310/20:00114195 - isvavai.cz</a>

Výsledek na webu

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ab82b1" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ab82b1</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ab82b1" target="_blank" >10.1088/1361-6595/ab82b1</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

Popis výsledku v původním jazyce

In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined in a high power impulse magnetron sputtering process. Three regions of interest within the deposition chamber were studied; the magnetised plasma region, middle region, and substrate region. Pulse length and applied power were kept constant and working pressure and duty cycle were varied. The effective branching fractions method was utilised to evaluate the number densities of sputtered species from a measured optical emission signal. A biasable quartz crystal microbalance system was used to evaluate the ionised flux fraction and deposition rate. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle and it was mostly independent on working pressure. Moving from the target, the ionised density fraction was observed to decrease. In the substrate region for a duty cycle below 2% and the whole studied working pressure range, the ionised density fraction always reached at least 50%.

Název v anglickém jazyce

Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS

Popis výsledku anglicky

In this paper, the ground state number densities of titanium atom and ion, ionised density fraction and ionised flux fraction were determined in a high power impulse magnetron sputtering process. Three regions of interest within the deposition chamber were studied; the magnetised plasma region, middle region, and substrate region. Pulse length and applied power were kept constant and working pressure and duty cycle were varied. The effective branching fractions method was utilised to evaluate the number densities of sputtered species from a measured optical emission signal. A biasable quartz crystal microbalance system was used to evaluate the ionised flux fraction and deposition rate. The highest ionised density fraction of 90% was reached in the target region for 1.2% duty cycle and it was mostly independent on working pressure. Moving from the target, the ionised density fraction was observed to decrease. In the substrate region for a duty cycle below 2% and the whole studied working pressure range, the ionised density fraction always reached at least 50%.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Svazek periodika

29

Číslo periodika v rámci svazku

5

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

1-10

Kód UT WoS článku

000538443000001

EID výsledku v databázi Scopus

2-s2.0-85085579208