Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F10%3A00503522" target="_blank" >RIV/49777513:23520/10:00503522 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

Popis výsledku v původním jazyce

High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average targetpower density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes ontothe substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relativ

Název v anglickém jazyce

Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

Popis výsledku anglicky

High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average targetpower density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes ontothe substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relativ

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2010

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Svazek periodika

108

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

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Kód UT WoS článku

000282646400017

EID výsledku v databázi Scopus

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