Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43920009" target="_blank" >RIV/49777513:23520/13:43920009 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.10.052" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2013.10.052</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.10.052" target="_blank" >10.1016/j.surfcoat.2013.10.052</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

Popis výsledku v původním jazyce

High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified stoichiometric ZrO2 and Ta2O5 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium or tantalum target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the average target power density from 5 W/cm^2 to 103 W/cm^2 during a deposition. The duty cycles ranged from 2.5 % to 10 %. The target-to-substrate distance was 100 mm. For the same duty cycle of 10 %, the deposition rates were up to 140 nm/min for the ZrO2 films and up to 345 nm/min for the Ta2O5 films. The ZrO2 films were crystalline. They exhibited a refractive index of 2.19 - 2.22 and an extinction coefficient of 0.002 - 0.006. The Ta2O5 films were nanocrystalline. They exhibited a refractive index of 2.09 - 2.15 and an extinction coefficient of

Název v anglickém jazyce

Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

Popis výsledku anglicky

High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified stoichiometric ZrO2 and Ta2O5 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium or tantalum target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the average target power density from 5 W/cm^2 to 103 W/cm^2 during a deposition. The duty cycles ranged from 2.5 % to 10 %. The target-to-substrate distance was 100 mm. For the same duty cycle of 10 %, the deposition rates were up to 140 nm/min for the ZrO2 films and up to 345 nm/min for the Ta2O5 films. The ZrO2 films were crystalline. They exhibited a refractive index of 2.19 - 2.22 and an extinction coefficient of 0.002 - 0.006. The Ta2O5 films were nanocrystalline. They exhibited a refractive index of 2.09 - 2.15 and an extinction coefficient of

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GAP108%2F12%2F0393" target="_blank" >GAP108/12/0393: Tvrdé nanokompozitní vrstvy se zvýšenou houževnatostí a unikátními vlastnostmi</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

2013

Číslo periodika v rámci svazku

236

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

7

Strana od-do

550-556

Kód UT WoS článku

000329884300074

EID výsledku v databázi Scopus

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