High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43928550" target="_blank" >RIV/49777513:23520/16:43928550 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.08.024" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2015.08.024</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.08.024" target="_blank" >10.1016/j.surfcoat.2015.08.024</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films

Popis výsledku v původním jazyce

High-power impulse magnetron sputtering (HiPIMS) with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric HfO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Hf target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density from 29 W/cm^2 to 54 W/cm^2. The voltage pulse durations ranged from 50 ?s to 200 ?s. The target-to-substrate distance was 100 mm and the substrate temperatures were less than 165 oC. We showed that the HfO2 films can be prepared with very high deposition rates (up to 200 nm/min) even at a deposition-averaged target power density of approximately 30 W/cm^2, which is relatively close to a target power density applicable in industrial HiPIMS systems. The films were nanocrystalline with a dominant monoclinic phase. They exhibited a hardness of 15-18 GPa, a refractive index of 2.07-2.12 and an extinction coefficient between LESS-THAN OR EQUAL TO 0.0001 and 0.0006 (both quantities at the wavelength of 550 nm). At 300 nm, the extinction coefficient was between 0.0015 and 0.007. A simplified relation for the deposition rate of films prepared using a reactive HiPIMS was presented.

Název v anglickém jazyce

High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films

Popis výsledku anglicky

High-power impulse magnetron sputtering (HiPIMS) with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric HfO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Hf target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density from 29 W/cm^2 to 54 W/cm^2. The voltage pulse durations ranged from 50 ?s to 200 ?s. The target-to-substrate distance was 100 mm and the substrate temperatures were less than 165 oC. We showed that the HfO2 films can be prepared with very high deposition rates (up to 200 nm/min) even at a deposition-averaged target power density of approximately 30 W/cm^2, which is relatively close to a target power density applicable in industrial HiPIMS systems. The films were nanocrystalline with a dominant monoclinic phase. They exhibited a hardness of 15-18 GPa, a refractive index of 2.07-2.12 and an extinction coefficient between LESS-THAN OR EQUAL TO 0.0001 and 0.0006 (both quantities at the wavelength of 550 nm). At 300 nm, the extinction coefficient was between 0.0015 and 0.007. A simplified relation for the deposition rate of films prepared using a reactive HiPIMS was presented.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface &amp; Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

290

Číslo periodika v rámci svazku

25 March 2016

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

58-64

Kód UT WoS článku

000374370600010

EID výsledku v databázi Scopus

2-s2.0-84939629398