High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43949524" target="_blank" >RIV/49777513:23520/16:43949524 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >http://dx.doi.org/10.14332/svc16.proc.0017</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >10.14332/svc16.proc.0017</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications

Popis výsledku v původním jazyce

High-power impulse magnetron sputtering with a pulsed reactive gas flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 and HfO2 films on floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar Zr and Hf target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the deposi¬tion-averaged target power density close to 30 W/cm^2 and 50 W/cm^2 with voltage pulse durations ranged from 50 μs to 200 μs (the duty cycles from 2.5% to 10%). The target-to-substrate distance was 100 mm. For the same duty cycle of 10%, the deposition rates were up to 120 nm/min for the ZrO2 films and even up to 345 nm/min for the HfO2 films. An effective feedback pulsed reactive gas flow control and a simplified relation for the deposition rate of films prepared using a reactive high-power impulse magnetron sputtering are presented.

Název v anglickém jazyce

High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications

Popis výsledku anglicky

High-power impulse magnetron sputtering with a pulsed reactive gas flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 and HfO2 films on floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar Zr and Hf target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the deposi¬tion-averaged target power density close to 30 W/cm^2 and 50 W/cm^2 with voltage pulse durations ranged from 50 μs to 200 μs (the duty cycles from 2.5% to 10%). The target-to-substrate distance was 100 mm. For the same duty cycle of 10%, the deposition rates were up to 120 nm/min for the ZrO2 films and even up to 345 nm/min for the HfO2 films. An effective feedback pulsed reactive gas flow control and a simplified relation for the deposition rate of films prepared using a reactive high-power impulse magnetron sputtering are presented.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016

ISBN

978-1-878068-36-1

ISSN

0737-5921

e-ISSN

neuvedeno

Počet stran výsledku

5

Strana od-do

135-139

Název nakladatele

SOCIETY OF VACUUM COATERS

Místo vydání

ALBUQUERQUE, NM 87122-1914 USA

Místo konání akce

Indianapolis, Indiana

Datum konání akce

9. 5. 2016

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000405161400019