Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO2 films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43950332" target="_blank" >RIV/49777513:23520/18:43950332 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.09.015" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2017.09.015</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.09.015" target="_blank" >10.1016/j.surfcoat.2017.09.015</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO2 films

Popis výsledku v původním jazyce

Reactive mid-frequency ac magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate depositions of defect-free, hard and highly optically transparent stoichiometric ZrO2 films onto floating substrates. The depositions were performed using two strongly unbalanced magnetrons in a closed-field configuration. We used planar Zr targets of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 1 Pa. The repetition frequency was close to 85 kHz at the deposition-averaged target power density, which is the same for both magnetrons, from 5.6 W/cm^2 to 15.7 W/cm^2. The target-to-substrate distance was approximately 100 mm and the substrate temperatures were less than 100 °C. For the deposition-averaged target power density of approximately 15.5 W/cm^2, we achieved very high deposition rates (up to 100 nm/min), being up to 3 times higher than the corresponding maximum deposition rate achieved in the oxide mode, usually used for the ZrO2 films in industry. The high-quality, defect-free ZrO2 films with smooth surfaces (the root-mean-square roughness 2.5–2.7 nm) were crystalline with a dominant monoclinic phase. They exhibited a hardness of 16 GPa, a refractive index of 2.20–2.21 and an extinction coefficient between 0.0002 and 0.0006 (both quantities at the wavelength of 550 nm).

Název v anglickém jazyce

Enhancement of the deposition rate in reactive mid-frequency ac magnetron sputtering of hard and optically transparent ZrO2 films

Popis výsledku anglicky

Reactive mid-frequency ac magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate depositions of defect-free, hard and highly optically transparent stoichiometric ZrO2 films onto floating substrates. The depositions were performed using two strongly unbalanced magnetrons in a closed-field configuration. We used planar Zr targets of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 1 Pa. The repetition frequency was close to 85 kHz at the deposition-averaged target power density, which is the same for both magnetrons, from 5.6 W/cm^2 to 15.7 W/cm^2. The target-to-substrate distance was approximately 100 mm and the substrate temperatures were less than 100 °C. For the deposition-averaged target power density of approximately 15.5 W/cm^2, we achieved very high deposition rates (up to 100 nm/min), being up to 3 times higher than the corresponding maximum deposition rate achieved in the oxide mode, usually used for the ZrO2 films in industry. The high-quality, defect-free ZrO2 films with smooth surfaces (the root-mean-square roughness 2.5–2.7 nm) were crystalline with a dominant monoclinic phase. They exhibited a hardness of 16 GPa, a refractive index of 2.20–2.21 and an extinction coefficient between 0.0002 and 0.0006 (both quantities at the wavelength of 550 nm).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GJ15-00859Y" target="_blank" >GJ15-00859Y: Design nových funkčních materiálů, a cest pro jejich přípravu atom po atomu, pomocí pokročilého počítačového modelování</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

336

Číslo periodika v rámci svazku

FEB 25 2018

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

54-60

Kód UT WoS článku

000425478000009

EID výsledku v databázi Scopus

2-s2.0-85029007546