The role of microwave plasma temperature during graphene nanosheets deposition on dielectric substrate: Modelling and experiment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F20%3A00114695" target="_blank" >RIV/00216224:14310/20:00114695 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.37904/nanocon.2019.8455" target="_blank" >http://dx.doi.org/10.37904/nanocon.2019.8455</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2019.8455" target="_blank" >10.37904/nanocon.2019.8455</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The role of microwave plasma temperature during graphene nanosheets deposition on dielectric substrate: Modelling and experiment

Popis výsledku v původním jazyce

The relation between plasma temperature and properties of graphene nanosheet layer deposited on Si/SiO2 substrate by decomposition of ethanol in microwave plasma torch discharge at atmospheric pressure was investigated in dependence on delivered microwave power and gas flow rates. Plasma modelling was carried out using COMSOL Multiphysics software with delivered microwave power, gas flow rates and experimental reactor geometry as input parameters. Results of the heat flow and fluid dynamics modelling were compared with substrate temperature measured by thermocouple integrated in quartz tube substrate holder. The graphene nanosheets layer was characterized by SEM, Raman spectroscopy and 4-point probe method. The layers were severals tens of micrometre thick and their sheet resistance varied from 2 to 40 kiloohm/sq. The properties of individual graphene nanosheets, 2D/G and D/G Raman band ratio, as well as the sheet resistance of their conductive network were correlated with the increase of plasma temperature with increasing microwave power. The substrate temperature increased linearly with delivered microwave power and the layer sheet resistance was decreasing with increasing microwave power and saturated at 2 kiloohm/sq and D/G ratio of 0.6.

Název v anglickém jazyce

The role of microwave plasma temperature during graphene nanosheets deposition on dielectric substrate: Modelling and experiment

Popis výsledku anglicky

The relation between plasma temperature and properties of graphene nanosheet layer deposited on Si/SiO2 substrate by decomposition of ethanol in microwave plasma torch discharge at atmospheric pressure was investigated in dependence on delivered microwave power and gas flow rates. Plasma modelling was carried out using COMSOL Multiphysics software with delivered microwave power, gas flow rates and experimental reactor geometry as input parameters. Results of the heat flow and fluid dynamics modelling were compared with substrate temperature measured by thermocouple integrated in quartz tube substrate holder. The graphene nanosheets layer was characterized by SEM, Raman spectroscopy and 4-point probe method. The layers were severals tens of micrometre thick and their sheet resistance varied from 2 to 40 kiloohm/sq. The properties of individual graphene nanosheets, 2D/G and D/G Raman band ratio, as well as the sheet resistance of their conductive network were correlated with the increase of plasma temperature with increasing microwave power. The substrate temperature increased linearly with delivered microwave power and the layer sheet resistance was decreasing with increasing microwave power and saturated at 2 kiloohm/sq and D/G ratio of 0.6.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON Conference Proceedings - International Conference on Nanomaterials

ISBN

9788087294956

ISSN

2694-930X

e-ISSN

—

Počet stran výsledku

5

Strana od-do

80-84

Název nakladatele

TANGER Ltd.

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

16. 10. 2019

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000664115400012