Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F21%3A00119165" target="_blank" >RIV/00216224:14310/21:00119165 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2021.127624" target="_blank" >https://doi.org/10.1016/j.surfcoat.2021.127624</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2021.127624" target="_blank" >10.1016/j.surfcoat.2021.127624</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

Popis výsledku v původním jazyce

The deposition rate, as well as the structure of a coating for a given magnetron sputtered material are determined by the plasma properties which are significantly dependent on the type of plasma generation. Single-pulse high power impulse magnetron sputtering (s-HiPIMS), multipulse HiPIMS (m-HiPIMS) with the same energy per pulse sequence and conventional direct current magnetron sputtering (DC-MS) were employed to deposit metallic Ti coatings. Varying the number of pulses in one pulse sequence in multipulse HiPIMS operation enables us to influence the ion fluxes on the substrate and the ionisation of the sputtered titanium. The grain size for the HiPIMS-deposited coatings was in the range of 5 to 25 nm depending on the number of pulses in the pulse sequence, whereas it was 15 nm for the coating prepared by the DC-MS. By the use of multipulse HiPIMS, it was also possible to achieve coatings with a smoother surface morphology and lower roughness as well rougher coatings with larger asperities and higher roughness compared to DC-MS. The texture and the deposition rate were significantly affected by the number of pulses, too.

Název v anglickém jazyce

Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

Popis výsledku anglicky

The deposition rate, as well as the structure of a coating for a given magnetron sputtered material are determined by the plasma properties which are significantly dependent on the type of plasma generation. Single-pulse high power impulse magnetron sputtering (s-HiPIMS), multipulse HiPIMS (m-HiPIMS) with the same energy per pulse sequence and conventional direct current magnetron sputtering (DC-MS) were employed to deposit metallic Ti coatings. Varying the number of pulses in one pulse sequence in multipulse HiPIMS operation enables us to influence the ion fluxes on the substrate and the ionisation of the sputtered titanium. The grain size for the HiPIMS-deposited coatings was in the range of 5 to 25 nm depending on the number of pulses in the pulse sequence, whereas it was 15 nm for the coating prepared by the DC-MS. By the use of multipulse HiPIMS, it was also possible to achieve coatings with a smoother surface morphology and lower roughness as well rougher coatings with larger asperities and higher roughness compared to DC-MS. The texture and the deposition rate were significantly affected by the number of pulses, too.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

423

Číslo periodika v rámci svazku

October

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

9

Strana od-do

„127624“

Kód UT WoS článku

000697566200041

EID výsledku v databázi Scopus

2-s2.0-85113321312