Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F21%3A00119592" target="_blank" >RIV/00216224:14310/21:00119592 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.confer.cz/nanocon/2020/3778-comparison-of-hmdso-and-hmdsz-thin-films-growth-under-dusty-plasma-conditions" target="_blank" >https://www.confer.cz/nanocon/2020/3778-comparison-of-hmdso-and-hmdsz-thin-films-growth-under-dusty-plasma-conditions</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2020.3778" target="_blank" >10.37904/nanocon.2020.3778</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions

Popis výsledku v původním jazyce

The present study is focused on the preparation of thin films by plasma enhanced chemical vapor deposition (PEDCV) in capacitively coupled plasma (CCP). Thin films were deposited from a mixture of oxygen and hexamethyldisiloxane (HMDSO) or hexamethyldisilazane (HMDSZ). Both monomers are well known and enable to prepare films with excellent properties such as high hardness, good abrasion resistance, hydrophobicity, and antibacterial properties. Also, these monomers are known for the creation of complex structures in plasma. This phenomenon is so-called dusty plasma. The main aim of the present work was to prepare a comparative study on the dust formation in both monomers. Complex study of surface and mechanical properties and chemical composition was done by a wide range of analytical instruments such as atomic force microscopy (AFM), nanoindentation technique, confocal microscopy, infrared spectroscopy with Fourier transformation (FTIR), stylus profilometer, and surface energy evaluation system (SEE system).

Název v anglickém jazyce

Comparison of HMDSO and HMDSZ thin films growth under dusty plasma conditions

Popis výsledku anglicky

The present study is focused on the preparation of thin films by plasma enhanced chemical vapor deposition (PEDCV) in capacitively coupled plasma (CCP). Thin films were deposited from a mixture of oxygen and hexamethyldisiloxane (HMDSO) or hexamethyldisilazane (HMDSZ). Both monomers are well known and enable to prepare films with excellent properties such as high hardness, good abrasion resistance, hydrophobicity, and antibacterial properties. Also, these monomers are known for the creation of complex structures in plasma. This phenomenon is so-called dusty plasma. The main aim of the present work was to prepare a comparative study on the dust formation in both monomers. Complex study of surface and mechanical properties and chemical composition was done by a wide range of analytical instruments such as atomic force microscopy (AFM), nanoindentation technique, confocal microscopy, infrared spectroscopy with Fourier transformation (FTIR), stylus profilometer, and surface energy evaluation system (SEE system).

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

12th International Conference on Nanomaterials - Research and Application, NANOCON 2020

ISBN

9788087294987

ISSN

2694-930X

e-ISSN

—

Počet stran výsledku

6

Strana od-do

541-546

Název nakladatele

TANGER Ltd.

Místo vydání

Ostrava

Místo konání akce

Brno, CZECH REPUBLIC

Datum konání akce

21. 10. 2020

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000664505500092