Influence of bias voltage on the microstructure and mechanical properties of TiZrN coatings prepared by reactive magnetron sputtering in industrial conditions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F25%3A00141229" target="_blank" >RIV/00216224:14310/25:00141229 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2025.132240" target="_blank" >https://doi.org/10.1016/j.surfcoat.2025.132240</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2025.132240" target="_blank" >10.1016/j.surfcoat.2025.132240</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Influence of bias voltage on the microstructure and mechanical properties of TiZrN coatings prepared by reactive magnetron sputtering in industrial conditions

Popis výsledku v původním jazyce

TiZrN coatings were prepared using three bias voltages of −50 V, −100 V and −175 V via a combinatorial approach, which led to the coatings with different Ti/(Ti+Zr) values. The deposition rate of TiN and ZrN remained practically constant with increasing the bias voltage. The TiZrN coatings, however, exhibited a drop of 15% in their deposition rates with increasing the bias voltage. The microstructure of TiN and ZrN did not change with the bias voltage applied, unlike TiZrN, which underwent microstructural changes with increasing bias voltage. For all binary and ternary nitrides, the lattice parameter increased and crystallite size decreased with increasing the bias voltage. All TiN, ZrN and TiZrN coatings showed enhanced compressive stress with increasing the bias voltage. ZrN hardness peaked at the bias voltage of −100 V, in contrast to that of TiN, which exhibited a constant increase with the bias voltage and peaked at −175 V. In ternary nitrides, bias voltage significantly influenced the hardness values, whereas in the case of Ti/(Ti+Zr), the effect was minimal, especially at the higher bias voltages. For all binary and ternary coatings, H/E and H3/E increased with the bias voltage, indicating an enhanced wear resistance and resilience with increasing bias voltage.

Název v anglickém jazyce

Influence of bias voltage on the microstructure and mechanical properties of TiZrN coatings prepared by reactive magnetron sputtering in industrial conditions

Popis výsledku anglicky

TiZrN coatings were prepared using three bias voltages of −50 V, −100 V and −175 V via a combinatorial approach, which led to the coatings with different Ti/(Ti+Zr) values. The deposition rate of TiN and ZrN remained practically constant with increasing the bias voltage. The TiZrN coatings, however, exhibited a drop of 15% in their deposition rates with increasing the bias voltage. The microstructure of TiN and ZrN did not change with the bias voltage applied, unlike TiZrN, which underwent microstructural changes with increasing bias voltage. For all binary and ternary nitrides, the lattice parameter increased and crystallite size decreased with increasing the bias voltage. All TiN, ZrN and TiZrN coatings showed enhanced compressive stress with increasing the bias voltage. ZrN hardness peaked at the bias voltage of −100 V, in contrast to that of TiN, which exhibited a constant increase with the bias voltage and peaked at −175 V. In ternary nitrides, bias voltage significantly influenced the hardness values, whereas in the case of Ti/(Ti+Zr), the effect was minimal, especially at the higher bias voltages. For all binary and ternary coatings, H/E and H3/E increased with the bias voltage, indicating an enhanced wear resistance and resilience with increasing bias voltage.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

511

Číslo periodika v rámci svazku

September

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

11

Strana od-do

132240

Kód UT WoS článku

001498956400001

EID výsledku v databázi Scopus

2-s2.0-105005593456