Ultrasmooth metallic foils for growth of high quality graphene by chemical vapor deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F14%3A00076532" target="_blank" >RIV/00216224:14740/14:00076532 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216305:26620/14:PU108759

Výsledek na webu

<a href="http://iopscience.iop.org/0957-4484/25/18/185601/article" target="_blank" >http://iopscience.iop.org/0957-4484/25/18/185601/article</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0957-4484/25/18/185601" target="_blank" >10.1088/0957-4484/25/18/185601</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ultrasmooth metallic foils for growth of high quality graphene by chemical vapor deposition

Popis výsledku v původním jazyce

Synthesis of graphene by chemical vapor deposition is a promising route for manufacturing large-scale high-quality graphene for electronic applications. The quality of the employed substrates plays a crucial role, since the surface roughness and defectsalter the graphene growth and cause dif fi culties in the subsequent graphene transfer. Here, we report on ultrasmooth high- purity copper foils prepared by sputter deposition of Cu thin fi lm on a SiO 2 /Si template, and the subsequent peeling off of the metallic layer from the template. The surface displays a low level of oxidation and contamination, and the roughness of the foil surface is generally de fi ned by the template, and was below 0.6 nm even on a large scale. The roughness and grain size increase occurred during both the annealing of the foils, and catalytic growth of graphene from methane ( +- 1000 °C), but on the large scale still remained far below the roughness typical for commercial foils.

Název v anglickém jazyce

Ultrasmooth metallic foils for growth of high quality graphene by chemical vapor deposition

Popis výsledku anglicky

Synthesis of graphene by chemical vapor deposition is a promising route for manufacturing large-scale high-quality graphene for electronic applications. The quality of the employed substrates plays a crucial role, since the surface roughness and defectsalter the graphene growth and cause dif fi culties in the subsequent graphene transfer. Here, we report on ultrasmooth high- purity copper foils prepared by sputter deposition of Cu thin fi lm on a SiO 2 /Si template, and the subsequent peeling off of the metallic layer from the template. The surface displays a low level of oxidation and contamination, and the roughness of the foil surface is generally de fi ned by the template, and was below 0.6 nm even on a large scale. The roughness and grain size increase occurred during both the annealing of the foils, and catalytic growth of graphene from methane ( +- 1000 °C), but on the large scale still remained far below the roughness typical for commercial foils.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

NANOTECHNOLOGY

ISSN

0957-4484

e-ISSN

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Svazek periodika

25

Číslo periodika v rámci svazku

18

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

1-8

Kód UT WoS článku

000334363600005

EID výsledku v databázi Scopus

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