Thermal dependence of photo-induced effects in spin-coated As(20)Ge(12.5)S(67.5) thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F17%3A39911006" target="_blank" >RIV/00216275:25310/17:39911006 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.jnoncrysol.2017.06.033" target="_blank" >http://dx.doi.org/10.1016/j.jnoncrysol.2017.06.033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jnoncrysol.2017.06.033" target="_blank" >10.1016/j.jnoncrysol.2017.06.033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Thermal dependence of photo-induced effects in spin-coated As(20)Ge(12.5)S(67.5) thin films

Popis výsledku v původním jazyce

Chalcogenide glass thin films of ternary As20Ge12.5S67.5 composition were prepared in specular quality using spin-coating technique from n-butylamine based glass solution. The content of organic residuals was notably reduced by post-deposition thermal treatment. The annealing process induced significant structural changes resulting in thin films with the structure close to the source bulk glass. The thickness of deposited thin films was decreasing with increasing annealing temperature. Contrary, the refractive index, optical bandgap, roughness and chemical stability were increasing. The experimental data also proved that deposited thin films were photosensitive as opto-physical properties and chemical resistance were changed after UV light exposure. The exposed thin films annealed bellow 90 degrees C were etched slower than unexposed ones (negative etching) and the thin films annealed above 90 degrees C were etched faster (positive etching).

Název v anglickém jazyce

Thermal dependence of photo-induced effects in spin-coated As(20)Ge(12.5)S(67.5) thin films

Popis výsledku anglicky

Chalcogenide glass thin films of ternary As20Ge12.5S67.5 composition were prepared in specular quality using spin-coating technique from n-butylamine based glass solution. The content of organic residuals was notably reduced by post-deposition thermal treatment. The annealing process induced significant structural changes resulting in thin films with the structure close to the source bulk glass. The thickness of deposited thin films was decreasing with increasing annealing temperature. Contrary, the refractive index, optical bandgap, roughness and chemical stability were increasing. The experimental data also proved that deposited thin films were photosensitive as opto-physical properties and chemical resistance were changed after UV light exposure. The exposed thin films annealed bellow 90 degrees C were etched slower than unexposed ones (negative etching) and the thin films annealed above 90 degrees C were etched faster (positive etching).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

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OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Non-Crystalline Solids

ISSN

0022-3093

e-ISSN

—

Svazek periodika

471

Číslo periodika v rámci svazku

September

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

415-420

Kód UT WoS článku

000407188100056

EID výsledku v databázi Scopus

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