The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F22%3A39919468" target="_blank" >RIV/00216275:25310/22:39919468 - isvavai.cz</a>

Výsledek na webu

<a href="https://onlinelibrary.wiley.com/doi/10.1002/admi.202201790" target="_blank" >https://onlinelibrary.wiley.com/doi/10.1002/admi.202201790</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/admi.202201790" target="_blank" >10.1002/admi.202201790</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Popis výsledku v původním jazyce

2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only approximate to 3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two-step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.

Název v anglickém jazyce

The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Popis výsledku anglicky

2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only approximate to 3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two-step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10402 - Inorganic and nuclear chemistry

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Advanced Materials Interfaces

ISSN

2196-7350

e-ISSN

2196-7350

Svazek periodika

9

Číslo periodika v rámci svazku

35

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

2201790

Kód UT WoS článku

000870037600001

EID výsledku v databázi Scopus

2-s2.0-85140035092