Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F21%3APU141697" target="_blank" >RIV/00216305:26210/21:PU141697 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/44555601:13420/21:43896400

Výsledek na webu

<a href="https://www.mdpi.com/2079-6412/11/9/1108" target="_blank" >https://www.mdpi.com/2079-6412/11/9/1108</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/coatings11091108" target="_blank" >10.3390/coatings11091108</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique

Popis výsledku v původním jazyce

Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 2(6) = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H-2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) x pretreatment H-2 (sccm).

Název v anglickém jazyce

Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique

Popis výsledku anglicky

Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 2(6) = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H-2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) x pretreatment H-2 (sccm).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Coatings, MDPI

ISSN

2079-6412

e-ISSN

—

Svazek periodika

11

Číslo periodika v rámci svazku

9

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

13

Strana od-do

1-13

Kód UT WoS článku

000699299400001

EID výsledku v databázi Scopus

2-s2.0-85115149303