Measurement and Optimization of an ECR Plasma Source

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU145321" target="_blank" >RIV/00216305:26220/21:PU145321 - isvavai.cz</a>

Výsledek na webu

<a href="https://ieeexplore.ieee.org/document/9694823" target="_blank" >https://ieeexplore.ieee.org/document/9694823</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1109/PIERS53385.2021.9694823" target="_blank" >10.1109/PIERS53385.2021.9694823</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Measurement and Optimization of an ECR Plasma Source

Popis výsledku v původním jazyce

Electron cyclotron resonance (ECR) is a very common technique for various kinds of applications. Among others, it is widely used in the field of semiconductor or material industry, electron microscopy or plasmatic machining. This paper deals with an ECR source of plasma, which is used for ions generation. The plasma source uses the cyclotron resonance principle for Xenon gas ionization and efficient plasma generation. This technology is advantageous for selected application for several reasons, especially for a wide range of optimization options of the drive system. The used measurement methods are based on well-known information about the ion source and standard working conditions. Within this paper, we optimize the conditions to find out the best set of input parameters. The output of this experiment is a multidimensional map of the working conditions, essential to evaluate the dependences of variable working pressure, excitation energies and frequencies and to understand the consequences, arising from this complex measurement. The test environment is based on an electron microscope system, which is used for measuring and controlling all working conditions. Above that, an external high-frequency power source was used for plasma excitation. Such setup enables to set and tune all the parameters, collect measured information, and interpret them easily.

Název v anglickém jazyce

Measurement and Optimization of an ECR Plasma Source

Popis výsledku anglicky

Electron cyclotron resonance (ECR) is a very common technique for various kinds of applications. Among others, it is widely used in the field of semiconductor or material industry, electron microscopy or plasmatic machining. This paper deals with an ECR source of plasma, which is used for ions generation. The plasma source uses the cyclotron resonance principle for Xenon gas ionization and efficient plasma generation. This technology is advantageous for selected application for several reasons, especially for a wide range of optimization options of the drive system. The used measurement methods are based on well-known information about the ion source and standard working conditions. Within this paper, we optimize the conditions to find out the best set of input parameters. The output of this experiment is a multidimensional map of the working conditions, essential to evaluate the dependences of variable working pressure, excitation energies and frequencies and to understand the consequences, arising from this complex measurement. The test environment is based on an electron microscope system, which is used for measuring and controlling all working conditions. Above that, an external high-frequency power source was used for plasma excitation. Such setup enables to set and tune all the parameters, collect measured information, and interpret them easily.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

20200 - Electrical engineering, Electronic engineering, Information engineering

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

2021 Photonics & Electromagnetics Research Symposium (PIERS)

ISBN

978-1-7281-7247-7

ISSN

1559-9450

e-ISSN

—

Počet stran výsledku

4

Strana od-do

358-361

Název nakladatele

IEEE

Místo vydání

NEW YORK

Místo konání akce

Hangzhou, China

Datum konání akce

21. 11. 2021

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000795902300052