Numerical Analysis of ECR Plasma Source

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU146189" target="_blank" >RIV/00216305:26220/21:PU146189 - isvavai.cz</a>

Výsledek na webu

<a href="https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9694836" target="_blank" >https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9694836</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1109/PIERS53385.2021.9694836" target="_blank" >10.1109/PIERS53385.2021.9694836</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Numerical Analysis of ECR Plasma Source

Popis výsledku v původním jazyce

Gases ionizers usage ECR (Electron Cyclotron Resonance) is one of the methods for creating two temperature plasma. Thanks to high efficiency is this method suitable for wide spectrum of applications. Especially for the systems which are sensitives on high power electrical noise, cooling is problematic for them or they have limited power supplier (electron microscopy, plasma actuators, etc.). The main disadvantage of ECR plasma sources is complicated design compared to the other ionisation techniques. The crucial is tune of the magnetostatics and high frequency fields in active area of the source. Working frequency also plays an important role and even electric and magnetic field ratio. This paper describes how to calculate electric and magnetic fields inside ECR plasma sources and how to enable tune and optimization of these sources. Paper also shows how to make visualisation of the active ECR surfaces and thereby deepening the understanding of how the sources works.

Název v anglickém jazyce

Numerical Analysis of ECR Plasma Source

Popis výsledku anglicky

Gases ionizers usage ECR (Electron Cyclotron Resonance) is one of the methods for creating two temperature plasma. Thanks to high efficiency is this method suitable for wide spectrum of applications. Especially for the systems which are sensitives on high power electrical noise, cooling is problematic for them or they have limited power supplier (electron microscopy, plasma actuators, etc.). The main disadvantage of ECR plasma sources is complicated design compared to the other ionisation techniques. The crucial is tune of the magnetostatics and high frequency fields in active area of the source. Working frequency also plays an important role and even electric and magnetic field ratio. This paper describes how to calculate electric and magnetic fields inside ECR plasma sources and how to enable tune and optimization of these sources. Paper also shows how to make visualisation of the active ECR surfaces and thereby deepening the understanding of how the sources works.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

20200 - Electrical engineering, Electronic engineering, Information engineering

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

2021 Photonics & Electromagnetics Research Symposium (PIERS)

ISBN

978-1-7281-7247-7

ISSN

1559-9450

e-ISSN

—

Počet stran výsledku

4

Strana od-do

419-422

Název nakladatele

IEEE

Místo vydání

NEW YORK

Místo konání akce

Hangzhou, China

Datum konání akce

21. 11. 2021

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000795902300064