Mechanical properties of individual layers in a-SiC:H multilayer film

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU96913" target="_blank" >RIV/00216305:26310/11:PU96913 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Mechanical properties of individual layers in a-SiC:H multilayer film

Popis výsledku v původním jazyce

Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determine

Název v anglickém jazyce

Mechanical properties of individual layers in a-SiC:H multilayer film

Popis výsledku anglicky

Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determine

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Svazek periodika

8

Číslo periodika v rámci svazku

12

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

9

Strana od-do

1107-1115

Kód UT WoS článku

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EID výsledku v databázi Scopus

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