Thickness measurement of thin soft organic films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU103402" target="_blank" >RIV/00216305:26310/12:PU103402 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Thickness measurement of thin soft organic films

Popis výsledku v původním jazyce

This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of themethod 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.

Název v anglickém jazyce

Thickness measurement of thin soft organic films

Popis výsledku anglicky

This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of themethod 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.

Druh

D - Stať ve sborníku

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

<a href="/cs/project/ED0012%2F01%2F01" target="_blank" >ED0012/01/01: Centra materiálového výzkumu na FCH VUT v Brně</a><br>

Návaznosti

O - Projekt operacniho programu

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Electronics Technology (ISSE), 2012 35th International Spring Seminar on

ISBN

978-1-4673-2241-6

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

367-372

Název nakladatele

Neuveden

Místo vydání

Bad Aussee, Austria

Místo konání akce

Bad Aussee

Datum konání akce

9. 5. 2012

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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