Optical properties of isotropic and anisotropic films deposited by pulsed plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F14%3APU113719" target="_blank" >RIV/00216305:26310/14:PU113719 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Optical properties of isotropic and anisotropic films deposited by pulsed plasma

Popis výsledku v původním jazyce

Isotropic plasma-polymerized films were made from tetravinylsilane (TVS) monomer and its mixture with argon or oxygen gas. Films were deposited on polished silicon wafer (100) using plasma-enhanced chemical vapor deposition at pulsed RF plasma (13.56 MHz). The substrates were pretreated by argon plasma (10sccm, 5.7Pa, 5 W) for 10min to improve the film adhesion. The films were prepared at a total mass flow rate of 3.8 sccm (2.7 Pa), the content of argon or oxygen gas in a mixture ranging 0-92%, and theeffective power operated from 2 to 250 W. The thickness of isotropic films was varied from 10 nm to 1 ?m. An in-situ phase-modulated spectroscopic ellipsometer UVISEL (Jobin-Yvon) was employed to characterize the film thickness and optical properties ofdeposited films in the spectral range 250-830 nm. The dispersion dependence of the dielectric function was fitted using the five-parametric Tauc-Lorentz formula. We found out that optical parameters of deposited films are controlled by ef

Název v anglickém jazyce

Optical properties of isotropic and anisotropic films deposited by pulsed plasma

Popis výsledku anglicky

Isotropic plasma-polymerized films were made from tetravinylsilane (TVS) monomer and its mixture with argon or oxygen gas. Films were deposited on polished silicon wafer (100) using plasma-enhanced chemical vapor deposition at pulsed RF plasma (13.56 MHz). The substrates were pretreated by argon plasma (10sccm, 5.7Pa, 5 W) for 10min to improve the film adhesion. The films were prepared at a total mass flow rate of 3.8 sccm (2.7 Pa), the content of argon or oxygen gas in a mixture ranging 0-92%, and theeffective power operated from 2 to 250 W. The thickness of isotropic films was varied from 10 nm to 1 ?m. An in-situ phase-modulated spectroscopic ellipsometer UVISEL (Jobin-Yvon) was employed to characterize the film thickness and optical properties ofdeposited films in the spectral range 250-830 nm. The dispersion dependence of the dielectric function was fitted using the five-parametric Tauc-Lorentz formula. We found out that optical parameters of deposited films are controlled by ef

Druh

O - Ostatní výsledky

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů