Nanoscratch Testing of Thin Films Prepared by Plasma Polymerization from the Vapour Phase of Tetravinylsilane Monomer

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F17%3APU124681" target="_blank" >RIV/00216305:26310/17:PU124681 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Nanoscratch Testing of Thin Films Prepared by Plasma Polymerization from the Vapour Phase of Tetravinylsilane Monomer

Popis výsledku v původním jazyce

One of the most important properties that determined application possibilities of thin films is their adhesion to the substrate. Value of the critical load obtained by nanoscratch test is the normal force which is evaluated from the measured load curves and corresponding to the first significant lateral force component fluctuation which correlates with the adhesion failure of the film. In addition, this critical load is load at which the adhesive failure occurs in the scratch track observed by atomic force microscopy. Thin films of hydrogenated amorphous carbon-silicon (a-SiC:H) alloy were deposited on silicon wafers from tetravinylsilane (TVS) monomer by plasma-enhanced chemical vapor deposition (PECVD). The pretreatment of silicon wafers was carried out with argon or oxygen plasmas (10 sccm, 5.7 Pa, 5-200 W) using continuous wave for 10 min to clean the surface from adsorbed gases and reach reproducible adhesion of films. A mass flow rate of TVS used for film deposition was 3.8 sccm at a pressure of

Název v anglickém jazyce

Nanoscratch Testing of Thin Films Prepared by Plasma Polymerization from the Vapour Phase of Tetravinylsilane Monomer

Popis výsledku anglicky

One of the most important properties that determined application possibilities of thin films is their adhesion to the substrate. Value of the critical load obtained by nanoscratch test is the normal force which is evaluated from the measured load curves and corresponding to the first significant lateral force component fluctuation which correlates with the adhesion failure of the film. In addition, this critical load is load at which the adhesive failure occurs in the scratch track observed by atomic force microscopy. Thin films of hydrogenated amorphous carbon-silicon (a-SiC:H) alloy were deposited on silicon wafers from tetravinylsilane (TVS) monomer by plasma-enhanced chemical vapor deposition (PECVD). The pretreatment of silicon wafers was carried out with argon or oxygen plasmas (10 sccm, 5.7 Pa, 5-200 W) using continuous wave for 10 min to clean the surface from adsorbed gases and reach reproducible adhesion of films. A mass flow rate of TVS used for film deposition was 3.8 sccm at a pressure of

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10403 - Physical chemistry

Projekt

<a href="/cs/project/GA16-09161S" target="_blank" >GA16-09161S: Syntéza multifunkčních plazmových polymerů pro polymerní kompozity bez rozhraní</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů