Adhesion and mechanical properties of a-CSi:H and a-CSiO:H thin films prepared by PECVD

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F18%3APU131465" target="_blank" >RIV/00216305:26310/18:PU131465 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Adhesion and mechanical properties of a-CSi:H and a-CSiO:H thin films prepared by PECVD

Popis výsledku v původním jazyce

The adhesion of the thin film (prepared by e.g. PVD or CVD) to the substrate is one of the most important properties and crucial attribute in determining of the thin film applications. Thin films with controlled adhesion are essential as anti-scratch, barrier, transparent, wear-resistant and antireflective coatings for surface modified materials. The greatest potential of this research for industrial applications is in glass-fiber-reinforced polymer composites without sharp interfaces and protective coatings. In this study, hydrogenated amorphous silicon-carbon (a-CSi:H) and hydrogenated amorphous carbon-silicon oxide (a-CSiO:H) thin films were characterized in terms of adhesion to the silicon substrate. Silicon wafers were pretreated with argon plasma (5.7 Pa, 10 sccm, 5 W, 10 min) using continuous wave to reach reproducible thin film adhesion. Thin films were deposited by plasma-enhanced chemical vapor deposition (PECVD) using pure tetravinylsilane (TVS) monomer or TVS in a mixture with argon or oxy

Název v anglickém jazyce

Adhesion and mechanical properties of a-CSi:H and a-CSiO:H thin films prepared by PECVD

Popis výsledku anglicky

The adhesion of the thin film (prepared by e.g. PVD or CVD) to the substrate is one of the most important properties and crucial attribute in determining of the thin film applications. Thin films with controlled adhesion are essential as anti-scratch, barrier, transparent, wear-resistant and antireflective coatings for surface modified materials. The greatest potential of this research for industrial applications is in glass-fiber-reinforced polymer composites without sharp interfaces and protective coatings. In this study, hydrogenated amorphous silicon-carbon (a-CSi:H) and hydrogenated amorphous carbon-silicon oxide (a-CSiO:H) thin films were characterized in terms of adhesion to the silicon substrate. Silicon wafers were pretreated with argon plasma (5.7 Pa, 10 sccm, 5 W, 10 min) using continuous wave to reach reproducible thin film adhesion. Thin films were deposited by plasma-enhanced chemical vapor deposition (PECVD) using pure tetravinylsilane (TVS) monomer or TVS in a mixture with argon or oxy

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10403 - Physical chemistry

Projekt

<a href="/cs/project/GA16-09161S" target="_blank" >GA16-09161S: Syntéza multifunkčních plazmových polymerů pro polymerní kompozity bez rozhraní</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů